Rapid Thermal Processing & Annealing
Rapid Thermal Processing or Rapid Thermal Annealing (RTP/RTA) is a semiconductor manufacturing process which provides a way to rapidly heat samples to high temperatures to perform short processes on a timescale of a few minutes maximum. Such rapid heating rates are performed by high intensity lamps (e.g. near-infrared light sources – Tungsten-halogen lamps) controlled by pyrometer and thermocouples that measure the sample temperature. Cooling must also be perfectly controlled to prevent dislocations and sample breakage.
Rapid Thermal Processing was originally developed for ion implant anneal but has broadened its application to oxidation, silicide formation, chemical vapor deposition, and advanced applications such as modifying the crystallographic phase of elements, compounds or alloys to enhance properties, lattice interface or stress relaxation. RTP is a flexible technology that provides fast heating and cooling to process temperatures of ~200-1300°C with ramp rates typically 20-200°C/sec, combined with excellent gas ambient control, allowing the creation of sophisticated multistage processes within one processing recipe.
Entry-level RTP System
Versatile & cost effective, software controlled desktop rapid thermal processing (RTP) tool specifically dseigned to meet requirements
of universities and research laboratories.
Jipelec JetFirst 100/200/300
Bench Top RTP System 100/200 mm
Software controlled bench top-type rapid thermal processing (RTP) tool
RTP System 300 mm
Software controlled rapid thermal processing (RTP) tool designed to meet requirements for up to 12” wafers
Research to Production RTP System
Versatile and robust rapid thermal processing (RTP) equipment designed for fast and error-free process data transferring from development to production.
The AS-Micro is a compact table top three-inch rapid thermal processor with vacuum capability dedicated to research applications. It can process substrates from few square millimeters up to 3-inch diameter or square.
The Annealsys AS-One system is available with two sizes of reactors to process substrates up to 100 mm (4”) or 150 mm (6”) diameter. The machine has been specially developed to meet the requirements of research laboratories and small-scale production.
The AS-Master is the perfect RTP system for production applications with cassette to cassette loading system. The manual loading version can be used for process development.
The AS-Premium reactor with the loadlock and turbo pumps provide oxygen free environment for silicon smoothening and other oxygen sensitive processes. The Annealsys AS-Premium system can process samples up to 150 mm diameter or 156x156 mm².
The Zenith-100 system can process samples up to 6-inch diameter at temperature up to 2000°C. It is specially developed to meet the requirements of universities research laboratories.
The new Eco Vacuum Furnace product line makes your heat treating a cleaner, safer, and more efficient operation.
Modular and compact design meets highest demands for productivity and part quality - oil or gas quenching.
Cristal furnaces for high temps insulated with specific metals & molybdenum or tungsten resistors.
Heat treatment vacuum furnace specifically tailored to alloys prone to oxidation.
View all ECM USA vacuum furnaces