Rapid Thermal Processing & Annealing
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Annealsys is a leading manufacturer of Rapid Thermal Processing and Direct Liquid Injection Deposition systems. We are a top supplier for MEMS, sensors, optoelectronics, telecommunication, power and discrete device manufacturing. Labs worldwide use our machines for the development of semiconductor, photovoltaic and nano-technology components.
Rapid Thermal Processing or Rapid Thermal Annealing (RTP/RTA) is a semiconductor manufacturing process which provides a way to rapidly heat samples to high temperatures to perform short processes on a timescale of a few minutes maximum. Such rapid heating rates are performed by high intensity lamps (e.g. near-infrared light sources – Tungsten-halogen lamps) controlled by pyrometer and thermocouples that measure the sample temperature. Cooling must also be perfectly controlled to prevent dislocations and sample breakage.
Rapid Thermal Processing was originally developed for ion implant anneal but has broadened its application to oxidation, silicide formation, chemical vapor deposition, and advanced applications such as modifying the crystallographic phase of elements, compounds or alloys to enhance properties, lattice interface or stress relaxation. RTP is a flexible technology that provides fast heating and cooling to process temperatures of ~200-1300°C with ramp rates typically 20-200°C/sec, combined with excellent gas ambient control, allowing the creation of sophisticated multistage processes within one processing recipe.
Annealsys AS-Master
Versatile 200 mm RTP/RTCVD system from Research to Production. From RT up to 1450°C down to 10-6 Torr. Extended RTCVD capabilities (option).
Annealsys AS-One
Versatile Rapid Thermal Processing cold wall chamber furnaces. 4-inch (100 mm) and 6-inch (150 mm) versions.
The AS-One RTP system is available for processing up 100 mm or up to 150 mm diameter substrates.
Annealsys AS-Premium
The AS-Premium is a multi-configuration RTP platform that processes silicon & compound semiconductor wafers up 150mm dia. or square. This system is used for R&D applications with manual loading or production applications with cassette to cassette atmospheric robot loading or a vacuum cluster tool.
Annealsys Zenith-Series
High Temperature RTP-CVD furnace up to 2000?C up to one hour.
The Zenith is high temperature RTP system that can run a one hour process at 2000°C
Annealsys AS-Micro
3-inch RTP System
Economical 3-inch RTP system for laboratories and education. Dual chamber version to avoid cross contamination issues. Optional glove box interface
Jipelec JetLight
2-inch RTP System
The JetLight is a 2-inch rapid thermal annealing system with vacuum capability. It is designed to provide a low cost solution for laboratories.
JIPELEC JetFirst 300
The JetFirst 300 is a 300mm cold wall chamber rapid thermal annealing system with gas mixing & vacuum capability standard features. The JetFirst system meets the requirements of Universities, R&D center and small-scale production unit.
